新品推荐 / Products
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![LP70多工位精密研磨和抛光系统](http://img47.chem17.com/gxhpic_afcc9a0b55/918f9a09f3f0cce064133ca0539f9248f613708ae4837d654f477ca8c0a59591a618636a9c521ee1_100_100_5.png)
LP70多工位精密研磨和抛光系统简要描述:Logitech将推出全新的LP70多工位精密研磨和抛光系统。 该高度自动化系统具有创新的特性和功能,是需要高规格表面光洁度和平整度应用的多晶圆加工的理想解决方案。
![PM6型精密研磨抛光系统](http://img51.chem17.com/gxhpic_afcc9a0b55/73772409919cd49252d9b668f8debec249c5975781bc4876a8938d016082a6ebf8d1bb81bd3864e0_100_100_5.jpg)
PM6型精密研磨抛光系统简要描述:PM6精密研磨抛光系统是生产商英国logitech公司发布的一款适用于科学研究水平的研磨和抛光机型,该机型是PM5型的升级版。能够完成4英寸及以下尺寸样品的小批量处理,整个过程全封闭控制,并内置自清洗...
![Akribis-Air智能研磨抛光机](http://img51.chem17.com/gxhpic_afcc9a0b55/9413136fc9958f62ef698c855a5c8b402103e8f778251c7953769c4b070ed4751e579de0f6bb5635_100_100_5.png)
Akribis-Air智能研磨抛光机简要描述:Akribis-Air智能研磨抛光机,具有高度自动化的独立系统,提供了工艺创新,在短时间内可实现Z高水平的处理。完整的Akribis-air研磨抛光系统具有智能自动化的功能,如盘面平整度控制、夹具自动...
![柜式化学机械研磨抛光设备](http://img55.chem17.com/gxhpic_afcc9a0b55/9413136fc9958f6291bfbe3eca765f4b8f4c9f3a61a202bbd41fe65d455c6c3218be7fbd76f9b138_100_100_5.jpg)
柜式化学机械研磨抛光设备简要描述:CMP Orbis 柜式化学机械研磨抛光设备,The Orbis CMP system is a precision engineered, floor standing CMP tool ideal...
![DP系列封闭式精密抛光系统](http://img51.chem17.com/gxhpic_afcc9a0b55/9413136fc9958f6291bfbe3eca765f4b39dd0497bf564da4da3c95702251a6b945ed57cf9681f0ac_100_100_5.jpg)
DP系列封闭式精密抛光系统简要描述:The Logitech DP high speed polishing systems have been designed for semi automated ?nal stage polish...
![DL系列封闭式精密研磨系统](http://img55.chem17.com/gxhpic_afcc9a0b55/9413136fc9958f6291bfbe3eca765f4bd4a46d5311212f87632779f04876115ce5c7fb97c673b03c_100_100_5.jpg)
DL系列封闭式精密研磨系统简要描述:The Logitech DL precision lapping systems process materials with high geometric precision. These sys...
![精密研磨抛光系统](http://img52.chem17.com/gxhpic_afcc9a0b55/9413136fc9958f62f49603ca4a00b08104d27eba619ed7de58b268b2f80f9df9f4c8b66d1d3cdaa2_100_100_5.jpg)
精密研磨抛光系统简要描述:Logitech PM5精密研磨抛光系统是带有一个工作站的台式机,适用于科学研究水平的研磨和抛光,能够完成4英寸及以下尺寸样品的小批量处理。具有加工样品*性高、规格水平高、表面光洁等特点。
![WSB自动粘片机](http://img59.chem17.com/gxhpic_afcc9a0b55/9413136fc9958f6291bfbe3eca765f4b55b19a694690e6b2426c028cdfb1edef4cc8730daaddac88_100_100_5.png)
WSB自动粘片机简要描述:The Logitech WSB unit offer premium bonding for the processing of fragile semiconductor wafers such ...
![线切割机](http://img51.chem17.com/gxhpic_afcc9a0b55/9413136fc9958f6291bfbe3eca765f4b09d07300186394fb6ce908c5718d3e0af0f4d66318417364_100_100_5.png)
线切割机简要描述:The AWS1 Abrasive Wire Saw allows fragile or diffi cult materials to be cut or wafered without fear ...
![CP4000化学抛光机](http://img51.chem17.com/gxhpic_afcc9a0b55/9413136fc9958f6291bfbe3eca765f4b365c3b41e2ecd9705c019bd771373147955f20e9c7cc1f00_100_100_5.jpg)
CP4000化学抛光机简要描述:Chemicals typically used in prime face polishing of semiconductor wafers or electronic and optoelect...
![台式化学机械研磨抛光设备](http://img51.chem17.com/gxhpic_afcc9a0b55/9413136fc9958f6291bfbe3eca765f4be8def6cfa5bc2c0b2b41e305e13227c1d1e4ca6b87d4bad0_100_100_5.jpg)
台式化学机械研磨抛光设备简要描述:CMP Tribo 台式化学机械研磨抛光设备,The Tribo CMP system is a precision engineered, bench top solution designed w...
![Logitech CP3000化学抛光设备](http://img52.chem17.com/gxhpic_afcc9a0b55/9413136fc9958f62f49603ca4a00b0810a29d2fed37064566f1a5a18a8de40dc84c0c74d4d24adfe_100_100_5.jpg)
Logitech CP3000化学抛光设备简要描述:Logitech CP3000化学抛光设备能很好的满足腐蚀抛光溶剂,同样也适用于腐蚀性较弱的Chemlox抛光,如半导体晶片的背抛光。现在的电子器件对于晶片尺寸,表面平整度、平行度及厚度控制都有非常苛...